The SE-m is a dedicated spectral ellipsomemeter for the semiconductor industry's customized micro-pattern structure measurements, using 1 ultra-small spot detection measurement technology, 2 Customized ultra-fast measurement speedsand other technologies. It can be applied to the n/k/d measurement of thin films such as anti-reflection coatings and conductive films on various transparent substrates, and is perfectly suitable for the analysis of various optical parameters of micro-area patterns.
It is applied to the measurement of optical constants, and is perfectly suitable for all kinds of coating inspection applications such as optical thin films.
âĒ Spot size can be customized, the minimum can be up to 30um;
âĒ Ultra-fast measurement, single measurement time is less than 0.5 seconds;
âĒ The series configuration is flexible, and it supports customized design of functions;
âĒ Compact structure, more suitable for online integrated measurement.