Sputtering Coating

Product Features

CORE ADVANTAGES

1. Magnetron Sputtering Fast Deposition
2. Multi-Angle All Covered Coating Sample Stage Diameter: 70mm Tilt Angle：±35° Lifting Distance： 0-20mm
3. Convenient Touchscreen Operation
4. Chamber Can Be Used As Sample Vacuum Reservoir

EASE OF USE

Performance Parameter

Plasma Cleaner

Core Advantages

• Inductively Coupled Plasma (ICP) technology to generates

plasma with much higher particle density than traditional

capacitively coupled technology.

• The high concentration of oxygen radicals generated can

efficiently remove surface hydrocarbon contami-nants on the

sample.

• "Downstream" cleaning method has no damage to the

sample and preserves the original surface morphology.

• Operating pressure range:0.01-500 Pa, will not damage the

high vacuum of electron microscope sample chamber.

• Integrated software control,one-button operation without

excessive user operation.

Multi-Functional Cleaner

Core Advantages

• Integrates Downstream plasma, ultravioletirradiation, and

heating vacuum detach-ment into one machine, cleaning

source can be switched at any time.

• Suitable for cleaning samples for various scanning electron

microscopes, focused on beam microscopes,and

transmission electron microscopes.

• High-resolution touch screen operation supports remote

control in WiFi environ-ment.

• Can be used as a constant temperature vacuum sample

storage cabinet.

Plasma Glow Discharger

Core Advantages

• Hydrophilization treatmentsignificantly improves the

wettability.

• Efficiently removes surface hydrocarbon contaminants

from scanning/transmission electron microscope samples.

• The sample chamber can be pumped to high vacuum

forvacuum storage ofsamples.

• Inductively Coupled Plasma (lCP) cleaning source has

no pollution to the samples.

• High-resolution touch screen,one-button operation.

Surrounding Products

Customer Service