Nanoimprint machine
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The Vacuum Pressure Nanoimprint System is an advanced nanoimprint lithography machine designed for high-precision nano pattern replication under controlled vacuum and pressure conditions. Ideal for semiconductor, photonics, MEMS, and advanced micro-nano fabrication applications.
The Fully Automatic Pneumatic Nanoimprint System is a high-precision nanoimprint lithography solution designed for automated industrial production. Featuring pneumatic pressure control, it ensures uniform nano-scale pattern replication for semiconductor, photonics, MEMS, and advanced micro-nano manufacturing.
Nanoimprint Mold designed for Nanoimprint Lithography (NIL) applications, enabling high-resolution nanostructure replication for semiconductor devices, photonics, biosensors, and advanced materials research.
Advanced Molecular Level Surface Treatment System designed for precise surface modification and adhesion control in semiconductor, nanoimprint lithography (NIL), photonics, and advanced materials fabrication.
Advanced High-Precision Double-Sided Alignment Roller Nanoimprint System designed for large-area nano patterning and flexible substrate applications. Ideal for photonics, optical films, AR waveguides, and micro-LED manufacturing.
Air Pressure Desktop Nanoimprint System designed for micro and nano pattern replication on material surfaces. Ideal for nanotechnology research, semiconductor fabrication, micro-nano manufacturing, and advanced materials development.
Composite Roller Nanoimprint System designed for continuous nano patterning using roll-to-roll nanoimprint lithography technology. Ideal for flexible electronics, optical films, nanostructured surfaces, and large-scale micro-nano fabrication processes.
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