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Advanced Nitrogen Generator: Reliable, Efficient, and Cost-Effective Solution Upgrade your nitrogen supply with our cutting-edge PSA nitrogen generator, delivering up to 99.999% purity for demanding applications in semiconductor, chemical, and lab environments.

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Filmetrics® R54 Series is a high-precision thin film thickness measurement system for semiconductor, micro-nano, and laboratory applications. Accurate optical reflectometry-based film thickness analysis with fast and reliable performance.

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Advanced Ion Beam Etching (IBE) system designed for precise micro-nano fabrication and semiconductor processing. High uniformity, anisotropic etching, and reliable dry etching performance for research and production environments.

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High-performance sputtering coating machine for precise thin film deposition in semiconductor, micro-nano fabrication, and research labs. Advanced PVD sputtering system with stable vacuum control and uniform coating results.

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High-performance multi-purpose enclosure with active vibration isolation system designed for precision laboratory instruments and micro-nano characterization. Ensures stable, low-vibration environments for semiconductor and research applications.

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Norcada Cleaner Tool is a high-precision surface cleaning system for micro-nano fabrication and semiconductor applications. Designed for effective plasma-based surface treatment and improved adhesion in laboratory and research environments.

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MC-4 Multi-Functional Cleaner is a compact bench-top plasma surface cleaning system designed for micro-nano fabrication, semiconductor research, and thin film preparation. Ideal for surface activation, contamination removal, and adhesion improvement in laboratory environments.

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YP-20 Plasma Cleaner is a compact portable plasma surface cleaning system designed for micro-nano characterization and semiconductor applications. Ideal for contamination removal, surface activation, and thin film adhesion improvement in laboratory and research environments.

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Tribometer is a precision friction and wear testing system designed for tribology research and mechanical material characterization. Ideal for measuring coefficient of friction, surface wear resistance, and material performance in laboratory and industrial environments.

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Force Measurement System is a high-precision solution for compression and tensile force analysis in tribological and mechanical testing applications. Designed for material characterization, research laboratories, and industrial testing environments.

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CG-0-4 High & Low Temperature Vacuum Probe Station is designed for semiconductor wafer testing and electrical characterization under controlled vacuum and extreme temperature conditions. Ideal for micro-nano research, material studies, and advanced device analysis.

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Three-Axis Precision Dispensing Machine is an automated XYZ dispensing system designed for high-accuracy adhesive and liquid material application. Ideal for PCB assembly, semiconductor packaging, and precision electronic manufacturing.

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The In-Situ TEM Four-Degree-of-Freedom Nanomanipulator is a high-precision nano positioning system designed for in-situ experiments inside Transmission Electron Microscopes (TEM). Ideal for materials science, nanotechnology, semiconductor research, and micro-nano characterization.

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The Vacuum Pressure Nanoimprint System is an advanced nanoimprint lithography machine designed for high-precision nano pattern replication under controlled vacuum and pressure conditions. Ideal for semiconductor, photonics, MEMS, and advanced micro-nano fabrication applications.

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The Fully Automatic Pneumatic Nanoimprint System is a high-precision nanoimprint lithography solution designed for automated industrial production. Featuring pneumatic pressure control, it ensures uniform nano-scale pattern replication for semiconductor, photonics, MEMS, and advanced micro-nano manufacturing.

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The In Situ AFM in SEM system integrates Atomic Force Microscopy within a Scanning Electron Microscope chamber, enabling simultaneous nano-scale topography and structural analysis. Ideal for semiconductor research, advanced materials science, and micro-nano device development.

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In-Situ Heating Chips & Holders enable precise temperature-controlled experiments inside SEM and TEM chambers. Designed for real-time thermal characterization of advanced materials, semiconductors, battery research, nanotechnology, and micro-device reliability testing.

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The Electron Microscope In-Situ Bias Heating System enables simultaneous electrical biasing and temperature-controlled experiments inside SEM or TEM chambers. Designed for semiconductor device testing, battery research, nanoelectronics, and advanced materials reliability analysis.

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The Off-Line Confocal Micro Raman & PL Spectroscopy System is designed for quality control, failure analysis, and advanced research. Fully customizable to integrate with semiconductor, materials science, and nano-device evaluation workflows.

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Scanning Thermal Microscopy (SThM) enables nano-scale temperature mapping and thermal conductivity measurement using AFM technology. Ideal for semiconductor hotspot detection, nanoelectronics evaluation, and advanced materials research.

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AFM Electrical Measurements Systems enable high-resolution electrical analysis including I-V spectroscopy, conductivity mapping, and nanoscale carrier transport studies. Ideal for semiconductor devices, nanoelectronics, and advanced materials research.

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The AFM Galaxy Dual Controller delivers high-speed, high-precision control for atomic force microscopy systems. Designed for advanced nano-imaging, semiconductor research, and multi-module electrical and mechanical characterization.

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The Nano-Observer AFM delivers reliable nano-scale imaging and surface analysis at an affordable cost. Ideal for universities, research laboratories, and materials science applications requiring high-quality AFM performance within budget.

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The Nano-Observer XL AFM is designed for high-precision nano-scale surface analysis on large samples and wafers. Ideal for semiconductor fabrication, advanced materials research, and industrial R&D applications.

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The Educational Scanning Microscope Probe is a user-friendly AFM platform designed for nanotechnology education. Ideal for universities, materials science laboratories, and STEM teaching environments.

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The Educational Scanning Tunneling Microscope (FM-Nano View T-STM) enables atomic-scale imaging of conductive materials. Designed for nanotechnology education, surface physics labs, and university STEM programs.

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The Hyperspectral Microscope System Type R enables high-resolution multi-wavelength spectral imaging at the microscale. Ideal for biomedical research, fluorescence analysis, materials science, and advanced laboratory applications.

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The Small Molecule Sublimation Purification Equipment enables high-purity processing of organic small molecules using controlled vacuum thermal sublimation. Ideal for OLED materials, organic semiconductors, and advanced materials R&D.

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The ICP Etching – 300 is a high-performance inductively coupled plasma etching system designed for deep silicon etching, high aspect ratio structures, and advanced semiconductor and MEMS fabrication.

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Customized PVD/PLD solution designed for advanced thin film deposition, semiconductor R&D, and micro-nano fabrication. Fully configurable chamber design, target configuration, substrate handling, and automation integration.

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The Pioneer 120 Advanced PLD System is a high-precision pulsed laser deposition tool designed for advanced thin film research, semiconductor materials, oxide films, and micro-nano fabrication applications.

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The Pioneer 180 PLD System is a high-performance pulsed laser deposition solution designed for advanced thin film research, oxide materials, semiconductor devices, and micro-nano fabrication laboratories.

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The SVAC-FilmLab-G PVD Thin Film Deposition System is a high-precision magnetron sputtering and vacuum coating platform designed for semiconductor R&D, micro-nano fabrication, and advanced materials research laboratories.

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The SVAC-FilmLab-B is a compact PVD thin film deposition system designed for university laboratories, semiconductor R&D, and micro-nano fabrication. It supports high-quality sputtering and vacuum coating processes in a space-efficient platform.

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The SVAC-FilmLab-T is a compact tabletop PVD thin film deposition system designed for university laboratories and R&D environments. It provides reliable sputtering and vacuum coating performance in a space-saving configuration.

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Nanoimprint Mold designed for Nanoimprint Lithography (NIL) applications, enabling high-resolution nanostructure replication for semiconductor devices, photonics, biosensors, and advanced materials research.

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Advanced Molecular Level Surface Treatment System designed for precise surface modification and adhesion control in semiconductor, nanoimprint lithography (NIL), photonics, and advanced materials fabrication.

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Advanced High-Precision Double-Sided Alignment Roller Nanoimprint System designed for large-area nano patterning and flexible substrate applications. Ideal for photonics, optical films, AR waveguides, and micro-LED manufacturing.

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High-performance Cathodoluminescence (CL) Imaging System designed for nanoscale optical and defect analysis in semiconductors, LEDs, photonics devices, and advanced materials research.

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Pharos310 Electron Beam Exposure System delivers ultra-high resolution nanometer-scale patterning for semiconductor research, nanophotonics, MEMS fabrication, and advanced materials development.

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