Micro-nano Fabrication

Advanced Ion Beam Etching (IBE) system designed for precise micro-nano fabrication and semiconductor processing. High uniformity, anisotropic etching, and reliable dry etching performance for research and production environments.

The Vacuum Pressure Nanoimprint System is an advanced nanoimprint lithography machine designed for high-precision nano pattern replication under controlled vacuum and pressure conditions. Ideal for semiconductor, photonics, MEMS, and advanced micro-nano fabrication applications.

The Fully Automatic Pneumatic Nanoimprint System is a high-precision nanoimprint lithography solution designed for automated industrial production. Featuring pneumatic pressure control, it ensures uniform nano-scale pattern replication for semiconductor, photonics, MEMS, and advanced micro-nano manufacturing.

The Small Molecule Sublimation Purification Equipment enables high-purity processing of organic small molecules using controlled vacuum thermal sublimation. Ideal for OLED materials, organic semiconductors, and advanced materials R&D.

The ICP Etching – 300 is a high-performance inductively coupled plasma etching system designed for deep silicon etching, high aspect ratio structures, and advanced semiconductor and MEMS fabrication.

Customized PVD/PLD solution designed for advanced thin film deposition, semiconductor R&D, and micro-nano fabrication. Fully configurable chamber design, target configuration, substrate handling, and automation integration.

The Pioneer 120 Advanced PLD System is a high-precision pulsed laser deposition tool designed for advanced thin film research, semiconductor materials, oxide films, and micro-nano fabrication applications.

The Pioneer 180 PLD System is a high-performance pulsed laser deposition solution designed for advanced thin film research, oxide materials, semiconductor devices, and micro-nano fabrication laboratories.

The SVAC-FilmLab-G PVD Thin Film Deposition System is a high-precision magnetron sputtering and vacuum coating platform designed for semiconductor R&D, micro-nano fabrication, and advanced materials research laboratories.

The SVAC-FilmLab-B is a compact PVD thin film deposition system designed for university laboratories, semiconductor R&D, and micro-nano fabrication. It supports high-quality sputtering and vacuum coating processes in a space-efficient platform.

The SVAC-FilmLab-T is a compact tabletop PVD thin film deposition system designed for university laboratories and R&D environments. It provides reliable sputtering and vacuum coating performance in a space-saving configuration.