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Filmetrics® R54 Series is a high-precision thin film thickness measurement system for semiconductor, micro-nano, and laboratory applications. Accurate optical reflectometry-based film thickness analysis with fast and reliable performance.

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Advanced Ion Beam Etching (IBE) system designed for precise micro-nano fabrication and semiconductor processing. High uniformity, anisotropic etching, and reliable dry etching performance for research and production environments.

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High-performance sputtering coating machine for precise thin film deposition in semiconductor, micro-nano fabrication, and research labs. Advanced PVD sputtering system with stable vacuum control and uniform coating results.

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High-performance multi-purpose enclosure with active vibration isolation system designed for precision laboratory instruments and micro-nano characterization. Ensures stable, low-vibration environments for semiconductor and research applications.

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Norcada Cleaner Tool is a high-precision surface cleaning system for micro-nano fabrication and semiconductor applications. Designed for effective plasma-based surface treatment and improved adhesion in laboratory and research environments.

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MC-4 Multi-Functional Cleaner is a compact bench-top plasma surface cleaning system designed for micro-nano fabrication, semiconductor research, and thin film preparation. Ideal for surface activation, contamination removal, and adhesion improvement in laboratory environments.

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YP-20 Plasma Cleaner is a compact portable plasma surface cleaning system designed for micro-nano characterization and semiconductor applications. Ideal for contamination removal, surface activation, and thin film adhesion improvement in laboratory and research environments.

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Tribometer is a precision friction and wear testing system designed for tribology research and mechanical material characterization. Ideal for measuring coefficient of friction, surface wear resistance, and material performance in laboratory and industrial environments.

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Force Measurement System is a high-precision solution for compression and tensile force analysis in tribological and mechanical testing applications. Designed for material characterization, research laboratories, and industrial testing environments.

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CG-0-4 High & Low Temperature Vacuum Probe Station is designed for semiconductor wafer testing and electrical characterization under controlled vacuum and extreme temperature conditions. Ideal for micro-nano research, material studies, and advanced device analysis.

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Three-Axis Precision Dispensing Machine is an automated XYZ dispensing system designed for high-accuracy adhesive and liquid material application. Ideal for PCB assembly, semiconductor packaging, and precision electronic manufacturing.

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The In-Situ TEM Four-Degree-of-Freedom Nanomanipulator is a high-precision nano positioning system designed for in-situ experiments inside Transmission Electron Microscopes (TEM). Ideal for materials science, nanotechnology, semiconductor research, and micro-nano characterization.

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The Vacuum Pressure Nanoimprint System is an advanced nanoimprint lithography machine designed for high-precision nano pattern replication under controlled vacuum and pressure conditions. Ideal for semiconductor, photonics, MEMS, and advanced micro-nano fabrication applications.

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The Fully Automatic Pneumatic Nanoimprint System is a high-precision nanoimprint lithography solution designed for automated industrial production. Featuring pneumatic pressure control, it ensures uniform nano-scale pattern replication for semiconductor, photonics, MEMS, and advanced micro-nano manufacturing.

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