Pulsed Laser Deposition System (Pioneer 180 PLD System)

Product Overview

Neocera Pioneer Series PLD System Innovative Design Based on Superior Experience Neocera has conducted extensive research using PLD to establish critical parameters for achieving film quality, especially for depositing complex oxide films. These considerations have been applied to the design of the Pioneer system.

• Many complex oxide films are cooled at relatively high oxygen pressures (>100 Torr) to achieve higher quality. This feature is available on all Pioneer systems (pressure ranges from rated initial pressure to atmospheric pressure). This is also beneficial for the generation of nanoparticles.
  
• The Pioneer PLD system has a laser beam incidence angle of 45°, maintaining maximum uniformity of laser density across the target while avoiding the use of complex and expensive optics. A larger angle of incidence elongates the laser spot on the target, resulting in a loss of density uniformity.
  
• In order to avoid the use of expensive oxygen-compatible vacuum pumps and to eliminate the effect of oil backflow on film quality, all Pioneer systems come standard with an oil-free pump system.
  
• Our research shows that the distance between the target and the substrate is a key parameter for achieving film quality. The Pioneer system controls the distance between the target and the substrate to achieve optimal deposition conditions.

Application Direction

Pulsed Laser Deposition is a widely used thin film deposition technique. The pulsed laser rapidly evaporates the target, resulting in a thin film that is identical to the target. The unique feature of the PLD is that the energy source (pulsed laser) is located outside the vacuum chamber. In this way, when the material is synthesized, the dynamic range of the working pressure is very wide, reaching 10-10 Torr ~ 100 Torr. By controlling the coating pressure and temperature, a range of nanostructures and nanoparticles with unique functions can be synthesized. In addition, PLD is a "digital" technology that controls the process (Å/pulse) at the nanoscale.

• Neocera has excellent experience in PLD equipment and process development The Pioneer series of PLD systems is widely used
  in R&D worldwide Neocera not only provides customers with the most basic PLD systems,
  A complete turnkey solution for PLD laboratories is also available