PVD/PLD
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Customized PVD/PLD solution designed for advanced thin film deposition, semiconductor R&D, and micro-nano fabrication. Fully configurable chamber design, target configuration, substrate handling, and automation integration.
The Pioneer 120 Advanced PLD System is a high-precision pulsed laser deposition tool designed for advanced thin film research, semiconductor materials, oxide films, and micro-nano fabrication applications.
The Pioneer 180 PLD System is a high-performance pulsed laser deposition solution designed for advanced thin film research, oxide materials, semiconductor devices, and micro-nano fabrication laboratories.
The SVAC-FilmLab-G PVD Thin Film Deposition System is a high-precision magnetron sputtering and vacuum coating platform designed for semiconductor R&D, micro-nano fabrication, and advanced materials research laboratories.
The SVAC-FilmLab-B is a compact PVD thin film deposition system designed for university laboratories, semiconductor R&D, and micro-nano fabrication. It supports high-quality sputtering and vacuum coating processes in a space-efficient platform.
The SVAC-FilmLab-T is a compact tabletop PVD thin film deposition system designed for university laboratories and R&D environments. It provides reliable sputtering and vacuum coating performance in a space-saving configuration.
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