Wafer-Stepping Nanometer Imprint System untuk Proses Nanoimprint Lithography

Short Description

Sistem Wafer-Stepping Nanometer Imprint untuk fabrikasi semikonduktor dan fotonik. Menyokong pemindahan corak nanometer berketepatan tinggi menggunakan teknologi Nanoimprint Lithography (NIL).

Categories: Product, Products Labs, Micro-nano Fabrication, Nanoimprint machine

Product Description

Specifications

Product Overview

Plate pressing | Air pressing | Roll pressing

Nanoimprint Technology matches different imprinting methods according to various industries and product applications.

For example:

Plate pressing: high-end semiconductors, microlenses, template splicing, high-precision alignment requirements

Air pressing: PSS, AR, biomedicine, photovoltaics, MLA, Meta Lens;

Roll pressing: AR, diffraction optics, surface relief

Sistem NIL Wafer Step-and-Repeat Nanoimprint Mesin Corak Nano Wafer Sistem Litografi Nano Ketepatan Tinggi wafer stepping nanoimprint machine mesin litografi nano wafer step and repeat NIL system sistem fabrikasi semikonduktor nano nano pattern wafer Malaysia