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CMP/EBL/CL

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Cathodoluminescence Imaging System

High-performance Cathodoluminescence (CL) Imaging System designed for nanoscale optical and defect analysis in semiconductors, LEDs, photonics devices, and advanced materials research.

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Cathodoluminescence Imaging and Spectral Detection System Cathodoluminescence Imaging and Spectral Detection System
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Electron Beam Exposure System Pharos310

Pharos310 Electron Beam Exposure System delivers ultra-high resolution nanometer-scale patterning for semiconductor research, nanophotonics, MEMS fabrication, and advanced materials development.

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Chemical Mechanical Polisher - xCMP150 Model Chemical Mechanical Polisher - xCMP150 Model
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