Micro-nano Fabrication

High-performance sputtering coating machine for precise thin film deposition in semiconductor, micro-nano fabrication, and research labs. Advanced PVD sputtering system with stable vacuum control and uniform coating results.

The Vacuum Pressure Nanoimprint System is an advanced nanoimprint lithography machine designed for high-precision nano pattern replication under controlled vacuum and pressure conditions. Ideal for semiconductor, photonics, MEMS, and advanced micro-nano fabrication applications.

The Fully Automatic Pneumatic Nanoimprint System is a high-precision nanoimprint lithography solution designed for automated industrial production. Featuring pneumatic pressure control, it ensures uniform nano-scale pattern replication for semiconductor, photonics, MEMS, and advanced micro-nano manufacturing.

High Concentration Ozone Water Machine designed for semiconductor and microelectronics cleaning processes. Provides high-efficiency ozone water for wafer surface cleaning, contamination removal, and advanced fabrication processes while reducing chemical usage.

High Concentration Ozone Destroyer designed for efficient decomposition and removal of excess ozone in semiconductor and industrial processes. Ideal for cleanroom environments, ensuring safety and preventing ozone accumulation in advanced manufacturing systems.

High Purity & High Concentration Plate Type Ozone Generator designed for semiconductor and microelectronics industries. Provides stable, high-purity ozone generation for advanced cleaning processes, ozone water production, and cleanroom applications.

Air Pressure Desktop Nanoimprint System designed for micro and nano pattern replication on material surfaces. Ideal for nanotechnology research, semiconductor fabrication, micro-nano manufacturing, and advanced materials development.

Wafer Semiconductor-Level Nanoimprint System designed for high-precision nano patterning on semiconductor wafers. Ideal for advanced micro-nano fabrication, semiconductor manufacturing, and nanotechnology research requiring accurate nanostructure replication.

Wafer-Stepping Nanometer Imprint System designed for high-precision nano patterning on semiconductor wafers. Utilizing nanoimprint lithography technology for advanced micro-nano fabrication, semiconductor device manufacturing, and nanotechnology research.

Composite Roller Nanoimprint System designed for continuous nano patterning using roll-to-roll nanoimprint lithography technology. Ideal for flexible electronics, optical films, nanostructured surfaces, and large-scale micro-nano fabrication processes.

Composite Roller Nanoimprint System designed for high-precision nano patterning and micro-nano fabrication processes. The system enables roll-to-roll nanoimprint lithography for optical films, microstructures, sensors, and advanced electronic materials, providing stable performance and high throughput for research and industrial production.