Ion Beam Etching (IBE) System for Micro-Nano Fabrication

Advanced Ion Beam Etching (IBE) system designed for precise micro-nano fabrication and semiconductor processing. High uniformity, anisotropic etching, and reliable dry etching performance for research and production environments.


Product Description

Product Overview



This website uses cookies for best user experience, to find out more you can go to our Privacy Policy and Cookies Policy
Compare product
0/4
Remove all
Compare
Powered By MakeWebEasy Logo MakeWebEasy