Nanoimprint machine
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The Vacuum Pressure Nanoimprint System is an advanced nanoimprint lithography machine designed for high-precision nano pattern replication under controlled vacuum and pressure conditions. Ideal for semiconductor, photonics, MEMS, and advanced micro-nano fabrication applications.
The Fully Automatic Pneumatic Nanoimprint System is a high-precision nanoimprint lithography solution designed for automated industrial production. Featuring pneumatic pressure control, it ensures uniform nano-scale pattern replication for semiconductor, photonics, MEMS, and advanced micro-nano manufacturing.
Air Pressure Desktop Nanoimprint System designed for micro and nano pattern replication on material surfaces. Ideal for nanotechnology research, semiconductor fabrication, micro-nano manufacturing, and advanced materials development.
Wafer Semiconductor-Level Nanoimprint System designed for high-precision nano patterning on semiconductor wafers. Ideal for advanced micro-nano fabrication, semiconductor manufacturing, and nanotechnology research requiring accurate nanostructure replication.
Wafer-Stepping Nanometer Imprint System designed for high-precision nano patterning on semiconductor wafers. Utilizing nanoimprint lithography technology for advanced micro-nano fabrication, semiconductor device manufacturing, and nanotechnology research.
Composite Roller Nanoimprint System designed for continuous nano patterning using roll-to-roll nanoimprint lithography technology. Ideal for flexible electronics, optical films, nanostructured surfaces, and large-scale micro-nano fabrication processes.
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