Product Overview
Plate pressing | Air pressing | Roll pressing
Nanoimprint Technology matches different imprinting methods according to various industries and product applications.
For example:
Plate pressing: high-end semiconductors, microlenses, template splicing, high-precision alignment requirements
Air pressing: PSS, AR, biomedicine, photovoltaics, MLA, Meta Lens;
Roll pressing: AR, diffraction optics, surface relief
Basic Information
Cleaning: Prepare the substrate samples that need to be processed, cleaning method is according to the sample requirements;
Filtrate: 0.22µ m organic filter;
Coating : 3000rpm, spin coating for 40 seconds, make sure that PL-R-AP have been coated already;
Press nanoimprint mold;
Light source: UVLED, 365nm, 20J/cm2 (60s, 0.5 W/cm2);
Separate the template from the sample after the resist has been cured;
Features
- Low haze, no nanoparticle doping
- High refractive index
- Suitable for nanoimprint processes
Specifications
Technical Characteristics
Refractive Index Curve
Spin Curve
Application Cases
Pattern Profiles
Download (Brochure)
Surrounding Products
Customer Service
MakeWebEasy