In a time when everything is getting smaller, faster, and more intelligent, nanoscale manufacturing has emerged as the foundation of innovation driving all things from computer chips and high-end displays to camera lenses and medical sensors. One of the technologies making this achievable is Nanoimprint Lithography (NIL) an accurate, simple, and inexpensive technique for achieving nanoscale patterns. In contrast to conventional lithography, NIL provides much lower costs of production while enabling both research and large-volume industrial use.
We Hong Kong NTI, Provide full technical solutions covering nanoimprint system, material, and applications, which forming complete technologies ecosystems. With over 15 years of global expertise, We service for semiconductor manufacture, consumer electronics, automotive electronics, life sciences and new energy. Our products and services are exported to USA, Canada, New Zealand and other countries.
Overview of the Nanoimprint System
Plate pressing | Air pressing | Roll pressing
Nanoimprint Technology matches different imprinting methods according to various industries and product applications.
For example:
- Plate pressing: high-end semiconductors, microlenses, template splicing, high-precision alignment requirements
- Air pressing: PSS, AR, biomedicine, photovoltaics, MLA, Meta Lens;
- Roll pressing: AR, diffraction optics, surface relief
Cleaning: Prepare the substrate samples that need to be processed, cleaning method is according to the sample requirements;
Filtrate: 0.22µ m organic filter;
Coating : 3000rpm, spin coating for 40 seconds, make sure that PL-R-AP have been coated already;
Press nanoimprint mold;
Light source: UV LED, 365nm, 20J/cm2 (60s, 0.5 W/cm2);
Separate the template from the sample after the resist has been cured;
Key Functions of Nanoimprint Lithography
1. Fits the Nanotechnology Era
Devices are becoming smaller and more intelligent. Nanoimprint Lithography (NIL) can produce sub-10nm structures more simply, quickly, and inexpensively than methods such as EUV lithography.
2. Affordable and Accessible
Through the use of a straightforward "stamp and press" technique, NIL enables SMEs and start up to achieve nanofabrication at a fraction of the cost of photolithography equipment.
3. Behind Everyday Technologies
NIL is instrumental in the production of smartphone camera lenses, high-definition AR/VR displays, and biosensors for health monitoring.
4. Stimulates Research and Innovation
Researchers can prototype and test new nanoscale structures within hours, enabling faster experimentation with new materials and surfaces.
5. Supports Green and Sustainable Technologies
NIL enables the production of very efficient photovoltaic cells, safer solid-state batteries, and low-friction coatings for electric vehicles, with lower energy consumption.
6. Facilitates Future Technologies
From quantum computing to wearable flexibles and lab-on-chip applications, NIL is central to future tech.
Specifications & Features
Features:
- Low haze, no nanoparticle doping
- High refractive index
- Suitable for nanoimprint processes
Technical Characteristics
Refractive Index Curve
Spin Curve
Application Cases
Pattern Profiles
Available Nanoimprint Machine Models
Surrounding Products
Download (Brochure)
Customer Service
We provide advanced micro-nano measurement tools, technology solutions, and synchrotron beamline services
to meet the diverse needs of our clients in research and development. We are dedicated to being your trusted partner on the path to technological progress and sustainable development, working together to drive industry advancements and build a better future.
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