The NTI-FE 1801 Field Emission Scanning Electron Microscope (FESEM) uses Schottky fieldemission electron gun (FEG) technology. Advanced full-column accelerating technology integrated into the electron optical column ensures outstanding imaging performance at low accelerating
voltages, enables high-resolution imaging of various materials. Multiple detectors system collects diverse electron signals emitted from the sample efficiently for imaging, revealing microscopic morphology and structural information of the sample to the maximum extent.
• Schottky field emission electron gun ensures beam stability and high imaging resolution.
• Full-column accelerating technology ensures high-imaging
performance of the electron beam at low accelerating voltages.
• Compound lens design combines electrostatic and magnetic fields. No magnetic fields leaks from objective lens, ensuring high quality imaging of magnetic samples.
• Simultaneous collection includes two types of secondary electron, backscattered electron, and transmitted electron signals.
• Simultaneous presentation of morphological and compositional contrast reveals the samples microscopic morphology and composition information to the maximum extent.
• Modular design with an expandable system architecture.
• Customized solutions are available according to specific application demands.
• Multiple ports compatible with various third-party accessories such as EDS, EBSD, WDS, CL, in-situ experimental device, etc., enabling both imaging and analysis.
• Inductively Coupled Plasma (ICP) technology to generates plasma with much higher particle density than traditional capacitively coupled technology.
• The high concentration of oxygen radicals generated can efficiently remove surface hydrocarbon contami-nants on the sample.
• "Downstream" cleaning method has no damage to the sample and preserves the original surface morphology.
• Operating pressure range:0.01-500 Pa, will not damage the high vacuum of electron microscope sample chamber.
• Integrated software control, one-button operation without excessive user operation.
• Integrates Downstream plasma, ultraviolet irradiation, and heating vacuum detachment into one machine, cleaning source can be switched at any time.
• Suitable for cleaning samples for various scanning electron
microscopes, focused on beam microscopes, and transmission electron microscopes.
• High-resolution touch screen operation supports remote control in Wi-Fi environment.
• Can be used as a constant temperature vacuum sample storage cabinet.
• Hydrophilization treatment significantly improves the wettability.
• Efficiently removes surface hydrocarbon contaminants
from scanning/transmission electron microscope samples.
• The sample chamber can be pumped to high vacuum for vacuum storage of samples.
• Inductively Coupled Plasma (lCP) cleaning source has no pollution to the samples.
• High-resolution touch screen, one-button operation.