Field Emission Scanning Electron Microscope (FESEM)

Field Emission Scanning Electron Microscope (FESEM) Product Overview

The NTI-FE 1801 Field Emission Scanning Electron Microscope (FESEM) uses Schottky fieldemission electron gun (FEG) technology. Advanced full-column accelerating technology integrated into the electron optical column ensures outstanding imaging performance at low accelerating

voltages, enables high-resolution imaging of various materials. Multiple detectors system collects diverse electron signals emitted from the sample efficiently for imaging, revealing microscopic morphology and structural information of the sample to the maximum extent.

FESEM Features and Specifications

Electron-Optics Design -การออกแบบระบบออปติกอิเล็กตรอน

Superior Electron-Optics Design

• Schottky field emission electron gun ensures beam stability and high imaging resolution.

• Full-column accelerating technology ensures high-imaging

performance of the electron beam at low accelerating voltages.

• Compound lens design combines electrostatic and magnetic fields. No magnetic fields leaks from objective lens, ensuring high quality imaging of magnetic samples.

Comprehensive Signal Collection System - ระบบรวบรวมสัญญาณอย่างครบวงจร

Comprehensive Signal Collection System

• Simultaneous collection includes two types of secondary electron, backscattered electron, and transmitted electron signals.

• Simultaneous presentation of morphological and compositional contrast reveals the samples microscopic morphology and composition information to the maximum extent.

กล้องจุลทรรศน์อิเล็กตรอนแบบส่องกราด - FESEM

• Modular design with an expandable system architecture.

• Customized solutions are available according to specific application demands.

• Multiple ports compatible with various third-party accessories such as EDS, EBSD, WDS, CL, in-situ experimental device, etc., enabling both imaging and analysis.

ข้อมูลจำเพาะ - FESEM Product Specifications

FESEM Application Cases

Plasma Cleaner

Core Advantages

• Inductively Coupled Plasma (ICP) technology to generates plasma with much higher particle density than traditional capacitively coupled technology.

• The high concentration of oxygen radicals generated can efficiently remove surface hydrocarbon contami-nants on the sample.

• "Downstream" cleaning method has no damage to the sample and preserves the original surface morphology.

• Operating pressure range:0.01-500 Pa, will not damage the high vacuum of electron microscope sample chamber.

• Integrated software control, one-button operation without excessive user operation.

Plasma Cleaner - เครื่องทำความสะอาดพลาสมา

Multi-Functional Cleaner

Multi-Functional Cleaner - เครื่องทำความสะอาดอเนกประสงค์

Core Advantages

• Integrates Downstream plasma, ultraviolet irradiation, and heating vacuum detachment into one machine, cleaning source can be switched at any time.

• Suitable for cleaning samples for various scanning electron

microscopes, focused on beam microscopes, and transmission electron microscopes.

• High-resolution touch screen operation supports remote control in Wi-Fi environment.

• Can be used as a constant temperature vacuum sample storage cabinet.

Cleaning Mode

Cleaning Mode - โหมดทำความสะอาด

Plasma Glow Discharger

Core Advantages

• Hydrophilization treatment significantly improves the wettability.

• Efficiently removes surface hydrocarbon contaminants

from scanning/transmission electron microscope samples.

• The sample chamber can be pumped to high vacuum for vacuum storage of samples.

• Inductively Coupled Plasma (lCP) cleaning source has no pollution to the samples.

• High-resolution touch screen, one-button operation.

Plasma Glow Discharger - เครื่องปล่อยประจุพลาสมา
Part of Plasma Glow Discharger

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