High-Value Maskless Lithography Platform

Mask-Free Precision Patterning, just with a Microscope

Simplifying Semiconductor Research

LITHO MASKLESS

Redefining Lithography, Without the Mask

LITHO MASKLESS is a compact tabletop lithography system

that Utilizes a UV LED-based DLP engine for mask-free patterning. Designed for simplicity and precision, it brings microfabrication out of the cleanroom and any research or education space.

Section Key Features

Microscope-Mountable Module Works with conventional brand microscopes, no additional footprint required

Instant Pattern Projection via Planck Software Upload an image and expose in seconds

Cleanroom-Free Operation Use directly inside a clean bench

Fully Maskless Workflow Eliminate photomask fabrication time and cost

Custom Image Patterning Supports PNG, JPG and grayscale patterns for flexible experiment design

Easy to Research

Easy to Use

proprietary software enables maskless lithography in just a few clicks, No prior expertise required. Designed as a modular add-on, it seamlessly mounts onto microscopes, bringing advanced lithography to your existing lab setup.

Easy Pattern Customization

Adjust pattern sizes and resolutions freely to suit diverse experimental needs. PLANCK LAB gives you the flexibility to design as precisely or as creatively as your research demands.

Easy High Resolution

Equipped with a high-power UV light source and a precision DMD chip, it achieves sub-micron resolution (<1µm), ensuring fast and accurate patterning for advanced research.

Easy Alignment

Real-time camera integration and an intuitive UI simplify the alignment process. Even first-time users can quickly and confidently align samples with high accuracy.

Easy Light Uniformity

AI-powered light uniformity correction ensures consistent pattern quality across the substrate optimized for repeatability, reliability, and research-grade results.

Easy to Set Up, Cleanroom-Free

Its compact design makes advanced lithography possible in any lab environment. All you need is a compatible standard microscope and the PLANCK LABs module. Enjoy up to 95% cost savings compared to conventional photolithography systems.

Trusted by Scholars, Cited by Journals

Studies on diverse patterns in the micrometer scale

Jeong, H., Cho, G. H., Yoo, J., Lee, S. M., Salas-Montiel, R., Ko, H., ... & Jeong, M. S. (2024). Strain-sensitive optical properties of monolayer tungsten diselenide. Applied Surface Science, 653, 159382.

Jeong, H., Suh, H. C., Cho, G. H., Salas-Montiel, R., Ko, H., Kim, K. K., & Jeong, M. S. (2024). Platform for surface-enhanced Raman scattering in layered quantum materials. Applied Surface Science, 646, 158823.

Hydrogel MEMS Resonators

Yoon, Y., Chae, I., Thundat, T., & Lee, J. (2019). Hydrogel Microelectromechanical System (MEMS) Resonators: Beyond Cost-Effective Sensing Platform. Advanced Materials Technologies, 4(3), 1800597.

Neuromorphic research via electrode patterning

Tominov, R., Vakulov, Z., Kazantsev, V., Prakash, C., Rodriguez, D., & Smirnov, V. (2024, September). Synaptic plasticity in the nanocrystalline ZnO cross-point for neuromorphic systems of AI. In 2024 8th Scientific School Dynamics of Complex Networks and their Applications (DCNA) (pp. 235238). IEEE.

Worldwide Academic Presence

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